Silicon Nitride Ultrathin Supports (SiN Windows)

Silicon Nitride Support Films for TEM imaging and analysis. These resilient, ultra-smooth, low stress inorganic SiN support films have been developed to enable specific nanotechnology and molecular biology research and are manufactured using the latest state-of-the-art semiconductor and MEMS fabrication techniques. These support films have the advantages of being chemically and mechanically robust and able to withstand temperatures to 1000°C. They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films. They provide a carbon-free, low background TEM specimen support. Benefits of SiN Windows • High resistance to temperature, acids, bases and solvents • Clean, ultra-flat, high planarity, low background, low scattering • Large viewing area without obstruction across the entire window • Carbon free and plasma cleanable